Colloidal MoS2 quantum dots for high-performance low power resistive memory devices with excellent temperature stability
| Title | Colloidal MoS2 quantum dots for high-performance low power resistive memory devices with excellent temperature stability |
| Publication Type | Journal Article |
| Year of Publication | 2022 |
| Authors | Bera, J, Betal, A, Sharma, A, Rath, AKumar, Sahu, S |
| Journal | Applied Physics Letters |
| Volume | 120 |
| Issue | 25 |
| Pagination | 253502 |
| Date Published | JUN |
| Type of Article | Article |
| ISSN | 0003-6951 |
| Abstract | Conventional memory technologies are facing enormous problems with downscaling, and are hence unable to fulfill the requirement of big data storage generated by a huge explosion of digital information. A resistive random access memory device (RRAM) is one of the most emerging technologies for next-generation computing data storage owing to its high-density stacking, ultrafast switching speed, high non-volatility, multilevel data storage, low power consumption, and simple device structure. In this work, colloidal MoS2 quantum dots (QDs) embedded in an insulating matrix of poly-(4vinylpyridine) (PVP) were used as an active layer to fabricate a RRAM device. The MoS2 QDs-PVP based RRAM device reveals an excellent nonvolatile resistive switching (RS) behavior with a maximum current on-off ratio (I-ON/I-OFF) of 10(5). High endurance, long retention time, and successive ``write-read-erase-read'' cycles indicate high-performance RRAM characteristics. The ultimate power consumption by this RRAM device is considerably low for energy saving. In addition, the MoS2 QDs-PVP based device shows RS behavior even at 130 degrees C. High I-ON/I-OFF, low operating power, high endurance, long retention time, and excellent stability with temperatures reveal that the MoS2 QDs-PVP based device can be a promising candidate for high-performance low power RRAM devices that can be operated at relatively higher temperatures. Published under an exclusive license by AIP Publishing. |
| DOI | 10.1063/5.0094892 |
| Type of Journal (Indian or Foreign) | Foreign |
| Impact Factor (IF) | 3.971 |
